Plasma processing
Encyclopedia
Plasma processing is a plasma
-based material processing technology that aims at modifying the chemical and physical properties of a surface.
Plasma processing techniques include:
Related topics are plasma chemistry, chemical vapor deposition
, and physical vapor deposition
processes like sputter deposition
, plasma ion doping, vacuum plasmaspraying, and reactive ion etching
.
Plasma (physics)
In physics and chemistry, plasma is a state of matter similar to gas in which a certain portion of the particles are ionized. Heating a gas may ionize its molecules or atoms , thus turning it into a plasma, which contains charged particles: positive ions and negative electrons or ions...
-based material processing technology that aims at modifying the chemical and physical properties of a surface.
Plasma processing techniques include:
- Plasma activationPlasma activationPlasma activation . It is done with the intent to alter or improve adhesion properties of surfaces prior to coating, painting, etc...
- Plasma etchingPlasma etchingPlasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge of an appropriate gas mixture being shot at a sample. The plasma source, known as etch species, can be either charged or neutral...
- Plasma modification
- Plasma functionalization
- Plasma polymerizationPlasma polymerizationPlasma polymerization uses plasma sources to generate a gas discharge that provides energy to activate or fragment gaseous or liquid monomer, often containing a vinyl group, in order to initiate polymerization. Polymers formed from this technique are generally highly branched and highly...
- Plasma cleaningPlasma cleaningPlasma cleaning involves the removal of impurities and contaminants from surfaces through the use of an energetic plasma created from gaseous species. Gases such as argon and oxygen, as well as mixtures such as air and hydrogen/nitrogen are used...
- Plasma electrolytic oxidationPlasma electrolytic oxidationPlasma electrolytic oxidation , also known as microarc oxidation , is an electrochemical surface treatment process for generating oxide coatings on metals. It is similar to anodizing, but it employs higher potentials, so that discharges occur and the resulting plasma modifies the structure of the...
Related topics are plasma chemistry, chemical vapor deposition
Chemical vapor deposition
Chemical vapor deposition is a chemical process used to produce high-purity, high-performance solid materials. The process is often used in the semiconductor industry to produce thin films. In a typical CVD process, the wafer is exposed to one or more volatile precursors, which react and/or...
, and physical vapor deposition
Physical vapor deposition
Physical vapor deposition is a variety of vacuum deposition and is a general term used to describe any of a variety of methods to deposit thin films by the condensation of a vaporized form of the desired film material onto various workpiece surfaces...
processes like sputter deposition
Sputter deposition
Sputter deposition is a physical vapor deposition method of depositing thin films by sputtering, that is ejecting, material from a "target," that is source, which then deposits onto a "substrate," such as a silicon wafer...
, plasma ion doping, vacuum plasmaspraying, and reactive ion etching
Reactive ion etching
Reactive-ion etching is an etching technology used in microfabrication. It uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure by an electromagnetic field...
.