A conformal film defines a morphologically uneven interface with another body and has a thickness that is the same everywhere along the interface. This is undoubtedly an idealization and may be used for abstract or theoretical purposes. Real films will exhibit thickness variations along edges, steps or other elements of the morphology of the interface but yet be considered conformal films depending on the magnitude of the thickness variations. Conformal films may be deposited by thin-film deposition methods, such as plating

Plating

Plating is a surface covering in which a metal is deposited on a conductive surface. Plating has been done for hundreds of years, but it is also critical for modern technology...

, chemical vapor deposition

Chemical vapor deposition

Chemical vapor deposition is a chemical process used to produce high-purity, high-performance solid materials. The process is often used in the semiconductor industry to produce thin films. In a typical CVD process, the wafer is exposed to one or more volatile precursors, which react and/or...

 or atomic layer deposition

Atomic layer deposition

Atomic layer deposition is a thin film deposition technique that is based on the sequential use of a gas phase chemical process. The majority of ALD reactions use two chemicals, typically called precursors. These precursors react with a surface one-at-a-time in a sequential manner...

.